Sub-Half-Micron Lithography for ULSIsAuthor :
Paperback
Published : Thursday 10 November 2005
Description
This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.
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